“Selective etching of hexagonal boron nitride by high-pressure CF₄ plasma for individual one-dimensional ohmic contacts to graphene layers”
Y. Seo, S. Masubuchi, E. Watanabe, M. Onodera, R. Moriya, K. Watanabe, T. Taniguchi, and T. Machida
Appl. Phys. Lett. 117, 243101-1-5 (2020)
DOI: 10.1063/5.0022557